The facility is Europe's first to deploy the most advanced Extreme Ultraviolet lithography equipment, enabling design and manufacturing of chips below two nanometres, and is designed to support applications spanning AI, autonomous driving, healthcare and 6G. What makes this a genuine best-practice example rather than simply a large capital announcement is the funding and governance model itself: a shared facility jointly financed by the EU, national and regional authorities and industry, giving companies and researchers who could never build equivalent infrastructure alone near-industrial-scale access to test new device architectures, materials and processes before committing to commercial-scale production.

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